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Home > Anterior Cervical Plating Systems > Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
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Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year
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Product Description

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Technical Specifications Overview

Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Technology
Physical Vapor Deposition
Method
Magnetron Sputtering
Automatic Grade
Automatic, Manual
Power Source
Hipims, DC, Mf, RF
Production
50 Sets Per Year
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Vacuum Plating Magnetron Sputtering System

This high-performance equipment features a reasonable structure for uniform coating quality. It offers high pumping speeds, short cycle times, and excellent stability with low energy consumption. It is widely used in automotive parts, audio equipment, small appliances, computers, watches, toys, mobile phones, reflective cups, and cosmetics.

Magnetron Sputtering System
Sputtering Equipment Detail
Vacuum Chamber View

DC Magnetron Sputtering: Ideal for direct sputtering coating on various substrates including plastics, glass, metal, and ceramics. With over 10 years of design experience, our magnetrons are available in rectangular, cylindrical, and circular configurations.

Coating Technology
Machine Interface
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Technical Parameters

Model Number SP-1000 SP-1200 SP-1400 SP-1800
Chamber Dimension (D*H) 1000*1100 1200*1400 1400*1600 1800*2000
Chamber Material Carbon steel, SUS304 or SUS316L
Sputtering Cathodes ≥1 sets, DC system, cylindrical or rectangle
Pumping System Turbo molecular or diffusion + mechanical pump
Pumping Time Atmosphere to 5.0*10-2Pa < 8 minutes
Ultimate Vacuum 5.0*10-4 Pa
Control Mode Automatic or Manual via PLC touch screen
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Production Components & Parts

We provide essential parts for daily production and maintenance:

  • Vacuum pumps and gauges
  • DC and Unbalanced sputtering cathodes
  • Bias power supplies and MFC
  • Magnetic valves and O-rings
  • Target materials and customized jigs
Accessories and Components
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Manufacturing & Workflow

Production Workflow 1
Production Workflow 2
Production Workflow 3
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Frequently Asked Questions

1. What materials can be coated using this system?
The system is highly versatile and can coat various substrates including plastics (ABS, PC, etc.), glass, metals, ceramics, and steel.
2. Is the operation fully automatic?
Yes, the equipment features an automatic grade with a PLC touch screen interface (10.4 or 15 inches), while also supporting manual mode for specific requirements.
3. Can the vacuum chamber size be customized?
Absolutely. All specifications, including chamber dimensions (diameter and height), quantity of sputtering cathodes, and pumping configurations, can be customized to your specific production needs.
4. How long does the pumping process take?
The system is designed for high efficiency, achieving a vacuum level from atmosphere to 5.0*10-2Pa in less than 8 minutes.
5. What types of functional films can be deposited?
The system is primarily used for functional coatings, such as silver thin film deposition and other metallic or dielectric coatings used in automotive and electronics industries.
6. What power sources are compatible with the sputtering system?
The equipment supports multiple sputtering power sources, including HiPIMS, DC, MF (Mid-Frequency), and RF (Radio Frequency), providing flexibility for different coating technologies.

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